The present application discloses a method of preparing a layout for manufacturing an integrated circuit chip according to a circuit design. In at least one embodiment, a pattern for the layout based on the circuit design is generated. After the generation of the pattern, it is determined if at least one layout rule is violated in the layout, the at least one layout rule being specified according to a predetermined maximum value for at least one of an estimated voltage drop along a signal path in the layout or an estimated current density on the signal path. If the at least one layout rule is violated, a violation is indicated.