Invention Grant
US08988658B2 Inspection apparatus to detect a target located within a pattern for lithography
有权
用于检测位于用于光刻的图案内的目标的检查装置
- Patent Title: Inspection apparatus to detect a target located within a pattern for lithography
- Patent Title (中): 用于检测位于用于光刻的图案内的目标的检查装置
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Application No.: US12989902Application Date: 2009-04-27
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Publication No.: US08988658B2Publication Date: 2015-03-24
- Inventor: Marcus Adrianus Van De Kerkhof
- Applicant: Marcus Adrianus Van De Kerkhof
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2009/003051 WO 20090427
- International Announcement: WO2009/138162 WO 20091119
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G03F7/20 ; G01N21/21 ; G01N21/956 ; G01N21/95

Abstract:
The invention relates to detecting targets located within patterns. The invention operates in the pupil plane by filtering the fourier transform from the surrounding pattern. In particular the method includes performing a fourier transform on reflected radiation data to form fourier transform data; removing portions of the fourier transform data which correspond to the target to form reduced fourier transform data; interpolating the portions of the reduced fourier transform data which were removed, to form product fourier transform data; and subtracting the product fourier transform data from the fourier transform data.
Public/Granted literature
- US20110164228A1 Inspection Apparatus for Lithography Public/Granted day:2011-07-07
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