Invention Grant
- Patent Title: Control method and apparatus
- Patent Title (中): 控制方法和装置
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Application No.: US13042928Application Date: 2011-03-08
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Publication No.: US08972031B2Publication Date: 2015-03-03
- Inventor: Everhardus Cornelis Mos , Birgitt Noëlle Cornelia Liduine Hepp , Jasper Thijs Menger
- Applicant: Everhardus Cornelis Mos , Birgitt Noëlle Cornelia Liduine Hepp , Jasper Thijs Menger
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G05B11/01
- IPC: G05B11/01 ; G03F7/20

Abstract:
A higher-level controller can correct measured metrology data with residual error values as reported by a lower-level controller. This results in a more accurate process disturbance estimate. A method of control obtains, based on measurement sample definition, a first process variable of a system under control, determines a residual error using the first process variable and a first set point, controls the system using the residual error, obtains, based on the same sample definition, a second process variable, and adjusts the second process variable using the residual error. The method may also include determining, using the adjusted second process variable, one or more first set points for controlling the system by the low-level controller that may vary in correspondence with the sample definition.
Public/Granted literature
- US20120059505A1 Control Method and Apparatus Public/Granted day:2012-03-08
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