Invention Grant
- Patent Title: Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient
- Patent Title (中): 具有重复结构的光刻设备和组件具有增加的热调节系数
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Application No.: US13478888Application Date: 2012-05-23
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Publication No.: US08970818B2Publication Date: 2015-03-03
- Inventor: Han-Kwang Nienhuys , Franciscus Johannes Joseph Janssen , Sven Pekelder , Roger Wilhelmus Antonius Henricus Schmitz , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling
- Applicant: Han-Kwang Nienhuys , Franciscus Johannes Joseph Janssen , Sven Pekelder , Roger Wilhelmus Antonius Henricus Schmitz , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20
Abstract:
A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.
Public/Granted literature
- US20120300187A1 LITHOGRAPHIC APPARATUS AND COMPONENT Public/Granted day:2012-11-29
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