Invention Grant
- Patent Title: Photointerrupter, method of manufacturing the same, and mounting structure of the same
- Patent Title (中): 光电断路器及其制造方法及其安装结构
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Application No.: US13568643Application Date: 2012-08-07
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Publication No.: US08969842B2Publication Date: 2015-03-03
- Inventor: Yoshinori Minamikawa
- Applicant: Yoshinori Minamikawa
- Applicant Address: JP Kyoto
- Assignee: Rohm Co., Ltd.
- Current Assignee: Rohm Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2011-172734 20110808; JP2012-41289 20120228; JP2012-158659 20120717
- Main IPC: G02B27/00
- IPC: G02B27/00 ; H01L25/16

Abstract:
A photointerrupter includes a base, a light emitting element, a light receiving element, a light-transmissive detector resin member covering the light receiving element, a light-transmissive emitter resin member covering the light emitting element, and a light shield layer covering the detector resin member and the emitter resin member. The emitter resin member is spaced apart from the detector resin member with an intervening clearance between them. The detector resin member includes a light incidence surface exposed from the light shield layer, and the emitter resin member includes a light output surface exposed from the light shield layer. The light incidence surface and the light output surface are arranged to face the clearance between the two resin members.
Public/Granted literature
- US20130037702A1 PHOTOINTERRUPTER, METHOD OF MANUFACTURING THE SAME, AND MOUNTING STRUCTURE OF THE SAME Public/Granted day:2013-02-14
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