Invention Grant
- Patent Title: Pattern-forming method
- Patent Title (中): 图案形成方法
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Application No.: US13397017Application Date: 2012-02-15
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Publication No.: US08968586B2Publication Date: 2015-03-03
- Inventor: Hayato Namai
- Applicant: Hayato Namai
- Applicant Address: JP Tokyo
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: B44C1/22
- IPC: B44C1/22
Abstract:
A pattern-forming method includes forming a prepattern on a substrate. A space other than a space in which the prepattern is formed on the substrate is filled with a resin composition containing a compound which is diffusible into the prepattern. The compound is diffused into a part of the prepattern. Portions in which the compound is undiffused in the prepattern are removed using a removing liquid.
Public/Granted literature
- US20130206727A1 PATTERN-FORMING METHOD Public/Granted day:2013-08-15
Information query
