Invention Grant
- Patent Title: Circularity measuring apparatus and measurement value correcting method for circularity measuring method
- Patent Title (中): 圆度测量装置和圆度测量方法的测量值校正方法
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Application No.: US13349016Application Date: 2012-01-12
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Publication No.: US08949071B2Publication Date: 2015-02-03
- Inventor: Ryo Takanashi
- Applicant: Ryo Takanashi
- Applicant Address: JP Tokyo
- Assignee: Tokyo Seimitsu Co., Ltd.
- Current Assignee: Tokyo Seimitsu Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-005009 20110113
- Main IPC: G06F15/00
- IPC: G06F15/00 ; G01B5/20 ; G01B7/28 ; G01B7/12 ; G01B21/20 ; G01B5/008 ; G01B21/04
Abstract:
According to the present invention, a center deviation amount, which is an amount of deviation (distance) between the center line of a reference measurement target and the detection point is calculated using the reference measurement target having a known diameter, and a measurement value of a diameter of an arbitrary measurement target is corrected using the center deviation amount. Therefore, an accurate diameter value can be calculated even in the case of a measurement target having a diameter value different from the diameter value of the reference measurement target.
Public/Granted literature
- US20120185210A1 CIRCULARITY MEASURING APPARATUS AND MEASUREMENT VALUE CORRECTING METHOD FOR CIRCULARITY MEASURING METHOD Public/Granted day:2012-07-19
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