Invention Grant
- Patent Title: Method and apparatus for chemical-mechanical polishing
- Patent Title (中): 化学机械抛光方法和装置
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Application No.: US13797381Application Date: 2013-03-12
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Publication No.: US08947834B2Publication Date: 2015-02-03
- Inventor: Eric Walter Singleton , Shaun Eric McKinlay , Stacey Christine Wakeham
- Applicant: Seagate Technology LLC
- Applicant Address: US CA Cupertino
- Assignee: Seagate Technology LLC
- Current Assignee: Seagate Technology LLC
- Current Assignee Address: US CA Cupertino
- Agency: HolzerIPLaw, PC
- Main IPC: G11B5/17
- IPC: G11B5/17
Abstract:
In accordance with certain embodiments, a method can be utilized that includes depositing a backfill material layer over a reader stack; depositing a chemical-mechanical-polishing stop layer above the layer of backfill material; and depositing a sacrificial layer on top of the chemical-mechanical-polishing stop layer.
Public/Granted literature
- US20140272472A1 METHOD AND APPARATUS FOR CHEMICAL-MECHANICAL POLISHING Public/Granted day:2014-09-18
Information query
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