Invention Grant
- Patent Title: Surface profile measuring apparatus and method
- Patent Title (中): 表面轮廓测量装置及方法
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Application No.: US13794884Application Date: 2013-03-12
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Publication No.: US08947674B2Publication Date: 2015-02-03
- Inventor: Atsushi Fukui , Hirotoshi Oikaze
- Applicant: Panasonic Corporation
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Panasonic Patent Center
- Priority: JP2012-098000 20120423
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01B11/24 ; G01B9/02

Abstract:
A surface profile measuring apparatus includes a reflection unit to reflect a reference beam diffracted by a first diffraction grating and cause the reflected reference beam to be incident on the first diffraction grating again, a detection unit to receive an interference beam in which the reference beam diffracted again by the first diffraction grating and a measuring beam reflected by a sample surface optically interfere with each other, and detect an interference intensity signal for each, wavelength in the interference beans, a shifting unit to shift the first diffraction grating in a direction perpendicular to a grating groove direction of the first diffraction grating, a calculation unit to calculates a phase on a basis of the interference intensity signal for each wavelength varying with a degree of shift, and a measurement unit to measure the sample surface.
Public/Granted literature
- US20130278938A1 SURFACE PROFILE MEASURING APPARATUS AND METHOD Public/Granted day:2013-10-24
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