Invention Grant
- Patent Title: Positioning device, lithographic apparatus, positioning method and device manufacturing method
- Patent Title (中): 定位装置，光刻设备，定位方法及装置制造方法
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Application No.: US13494703Application Date: 2012-06-12
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Publication No.: US08947640B2Publication Date: 2015-02-03
- Inventor: Raymond Wilhelmus Louis Lafarre , Henrikus Herman Marie Cox , Antonius Franciscus Johannes De Groot , Johannes Petrus Martinus Bernardus Vermeulen
- Applicant: Raymond Wilhelmus Louis Lafarre , Henrikus Herman Marie Cox , Antonius Franciscus Johannes De Groot , Johannes Petrus Martinus Bernardus Vermeulen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/68
Abstract:
A positioning device for positioning an object within a lithographic apparatus, including a support structure for supporting the object, at least two short-stroke units, each connected to the support structure, and a long-stroke unit. In the arrangement, each of the short-stroke units includes a short-stroke actuator system configured to provide independently at least one actuation force between the short-stroke unit and the long-stroke unit, and the long-stroke unit includes a long-stroke actuator system configured to provide at least one actuation force between the long-stroke unit and a reference structure of the lithographic apparatus.
Public/Granted literature
- US20120327387A1 POSITIONING DEVICE, LITHOGRAPHIC APPARATUS, POSITIONING METHOD AND DEVICE MANUFACTURING METHOD Public/Granted day:2012-12-27
Information query
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