Invention Grant
- Patent Title: Exposure method and apparatus measuring position of movable body based on information on flatness of encoder grating section
- Patent Title (中): 基于编码器光栅部分平面度信息的曝光方法和装置测量移动体的位置
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Application No.: US13469828Application Date: 2012-05-11
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Publication No.: US08947639B2Publication Date: 2015-02-03
- Inventor: Yuichi Shibazaki
- Applicant: Yuichi Shibazaki
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2006-236975 20060831
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20
Abstract:
A drive unit drives a wafer stage in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale that is measured by the encoder. In this case, the drive unit can drive the wafer stage in a predetermined direction based on a measurement value after correction in which a measurement error caused by the flatness of the scale included in the measurement value of the encoder is corrected based on the information on the flatness of the scale. Accordingly, the wafer stage can be driven with high accuracy in a predetermined direction using the encoder, without being affected by the unevenness of the scale.
Public/Granted literature
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