Invention Grant
- Patent Title: Highly sensitive monoclonal antibody residual detection assay
- Patent Title (中): 高度敏感的单克隆抗体残留检测测定
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Application No.: US13231280Application Date: 2011-09-13
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Publication No.: US08945860B2Publication Date: 2015-02-03
- Inventor: Lihua Yang , Natarajan Ramasubramanyan
- Applicant: Lihua Yang , Natarajan Ramasubramanyan
- Applicant Address: US IL North Chicago
- Assignee: Abbvie Inc.
- Current Assignee: Abbvie Inc.
- Current Assignee Address: US IL North Chicago
- Agency: Lathrop & Gage LLP
- Agent Andrew T. Wilkins; Peter W. Dini
- Main IPC: G01N33/53
- IPC: G01N33/53 ; G01N33/566 ; G01N33/563 ; C07K16/42 ; G01N33/68
Abstract:
The present invention relates to compositions and highly sensitive methods for the detection of biotechnology product residual when monitoring product carry over and/or for cleaning verification in the manufacture of biotechnology products. In particular, the present invention is directed to immunoassays wherein one or more capture antibodies, or antigen binding fragments thereof, are used to detect residuals associated with the production of biotechnology products.
Public/Granted literature
- US20120129196A1 HIGHLY SENSITIVE MONOCLONAL ANTIBODY RESIDUAL DETECTION ASSAY Public/Granted day:2012-05-24
Information query
IPC分类:
