Invention Grant
US08842933B2 Facial motion capture using marker patterns that accommodate facial surface
有权
使用适合面部表面的标记图案进行面部运动捕捉
- Patent Title: Facial motion capture using marker patterns that accommodate facial surface
- Patent Title (中): 使用适合面部表面的标记图案进行面部运动捕捉
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Application No.: US12938317Application Date: 2010-11-02
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Publication No.: US08842933B2Publication Date: 2014-09-23
- Inventor: Parag Havaldar
- Applicant: Parag Havaldar
- Applicant Address: JP Tokyo US CA Culver City
- Assignee: Sony Corporation,Sony Pictures Technologies Inc
- Current Assignee: Sony Corporation,Sony Pictures Technologies Inc
- Current Assignee Address: JP Tokyo US CA Culver City
- Agency: Procopio, Cory, Hargreaves & Savitch, LLP
- Main IPC: G06K9/36
- IPC: G06K9/36 ; G06T13/40 ; G06T7/20

Abstract:
Capturing facial surface using marker patterns laid out on the facial surface by adapting the marker patterns to contours of the facial surface and motion range of a head including: generating a facial action coding system (FACS) matrix by capturing FACS poses; generating a pattern to wrap over the facial surface using the FACS poses as a guide; capturing and tracking marker motions of the pattern; stabilizing the marker motions of the pattern using a head stabilization transform to remove head motions from the marker motions; and generating and applying a plurality of FACS matrix weights to the stabilized marker motions.
Public/Granted literature
- US20110110561A1 FACIAL MOTION CAPTURE USING MARKER PATTERNS THAT ACCOMODATE FACIAL SURFACE Public/Granted day:2011-05-12
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