Invention Grant
US08842709B2 Surface emitting semiconductor laser, manufacturing method for surface emitting semiconductor laser, surface emitting semiconductor laser device, optical transmission device, and information processing device 有权
表面发射半导体激光器,表面发射半导体激光器的制造方法,表面发射半导体激光器件,光传输器件和信息处理器件

  • Patent Title: Surface emitting semiconductor laser, manufacturing method for surface emitting semiconductor laser, surface emitting semiconductor laser device, optical transmission device, and information processing device
  • Patent Title (中): 表面发射半导体激光器,表面发射半导体激光器的制造方法,表面发射半导体激光器件,光传输器件和信息处理器件
  • Application No.: US13910553
    Application Date: 2013-06-05
  • Publication No.: US08842709B2
    Publication Date: 2014-09-23
  • Inventor: Kazutaka TakedaTakashi Kondo
  • Applicant: Fuji Xerox Co., Ltd.
  • Applicant Address: JP Tokyo
  • Assignee: Fuji Xerox Co., Ltd.
  • Current Assignee: Fuji Xerox Co., Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2012-174544 20120807
  • Main IPC: H01S5/00
  • IPC: H01S5/00 H01S5/183 H01S5/343 H01S5/022
Surface emitting semiconductor laser, manufacturing method for surface emitting semiconductor laser, surface emitting semiconductor laser device, optical transmission device, and information processing device
Abstract:
A surface emitting semiconductor laser includes a first semiconductor multilayer reflector of a first conductivity type, an active area, a second semiconductor multilayer reflector of a second conductivity type, a current confinement layer having a conductive area and a surrounding high-resistance area, each provided on a substrate, and a higher-order transverse mode suppressing layer formed on an emission surface from which laser light is emitted and in an area in which higher-order transverse mode is induced. The higher-order transverse mode suppressing layer includes first to third insulation films having first to third refractive indices, respectively, formed on each other, and capable of transmitting an oscillation wavelength. The second refractive index is lower than the first refractive index. The third refractive index is higher than the second refractive index. The optical film thickness of the first to third insulation films is an odd number times one-fourth of the oscillation wavelength.
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