Invention Grant
US08841717B2 Semiconductor device and method of forming the same 有权
半导体器件及其形成方法

Semiconductor device and method of forming the same
Abstract:
In one embodiment, a semiconductor device includes a semiconductor substrate having a first groove; and a plurality of first pillars over the substrate. The plurality of first pillars is disposed beside the first groove. A first insulator is disposed in the first groove. A bit contact is disposed in the first groove and over the first insulator. The bit contact is coupled to side surfaces of the plurality of first pillars.
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