Invention Grant
- Patent Title: Nonvolatile semiconductor memory device and method for manufacuring the same
- Patent Title (中): 非易失性半导体存储器件及其制造方法
-
Application No.: US13600991Application Date: 2012-08-31
-
Publication No.: US08837223B2Publication Date: 2014-09-16
- Inventor: Wataru Sakamoto , Fumitaka Arai , Takashi Kobayashi , Ken Komiya , Shinichi Sotome , Tatsuya Kato
- Applicant: Wataru Sakamoto , Fumitaka Arai , Takashi Kobayashi , Ken Komiya , Shinichi Sotome , Tatsuya Kato
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-253928 20111121; JP2011-255910 20111124; JP2012-062726 20120319; JP2012-069040 20120326
- Main IPC: G11C16/04
- IPC: G11C16/04 ; G11C16/34 ; G11C11/56 ; H01L21/28 ; H01L29/788 ; G11C16/10

Abstract:
A nonvolatile semiconductor memory device according to an embodiment includes: a memory cell array in which a plurality of NAND cell units are arranged, the NAND cell units including a plurality of memory cells, and select gate transistors, the memory cell including a semiconductor layer, a gate insulating film, a charge accumulation layer, and a control gate; and a control circuit. The control circuit adjusts a write condition of each of the memory cells in accordance with write data to each of the memory cells and memory cells adjacent to the memory cells within the data to be written.
Public/Granted literature
- US20130235666A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACURING THE SAME Public/Granted day:2013-09-12
Information query