Invention Grant
US08837204B2 Four-transistor and five-transistor BJT-CMOS asymmetric SRAM cells 有权
四晶体管和五晶体管BJT-CMOS非对称SRAM单元

  • Patent Title: Four-transistor and five-transistor BJT-CMOS asymmetric SRAM cells
  • Patent Title (中): 四晶体管和五晶体管BJT-CMOS非对称SRAM单元
  • Application No.: US13201461
    Application Date: 2010-02-15
  • Publication No.: US08837204B2
    Publication Date: 2014-09-16
  • Inventor: Gil Asa
  • Applicant: Gil Asa
  • Applicant Address: IL Zichron Yakkov
  • Assignee: NDEP Technologies Ltd.
  • Current Assignee: NDEP Technologies Ltd.
  • Current Assignee Address: IL Zichron Yakkov
  • Agency: Pearl Cohen Zedek Latzer Baratz LLP
  • International Application: PCT/IB2010/050668 WO 20100215
  • International Announcement: WO2010/092555 WO 20100819
  • Main IPC: G11C11/00
  • IPC: G11C11/00
Four-transistor and five-transistor BJT-CMOS asymmetric SRAM cells
Abstract:
A memory cell comprises asymmetric retention elements formed of bipolar junction transistors integrated with a CMOS transistor. The BJT transistors of the retention element may be vertically stacked. In one embodiment, the N region of two adjacent NPN BJT transistors may be connected to ground and may form a common emitter of the NPN BJT transistors while the P region of two adjacent PNP BJT transistors may be connected to high voltage and may form a common emitter of the PNP BJT transistors. For further compactness in one embodiment a base of one transistor doubles as a collector of another transistor. The retention element may have only a single bit line and a single write line, with no negative bit line. In some embodiments, a single inverter and only three transistors may form the retention element. Memory space may be cut approximately in half.
Public/Granted literature
Information query
Patent Agency Ranking
0/0