Invention Grant
- Patent Title: Environmental system including a transport region for an immersion lithography apparatus
- Patent Title (中): 环境系统包括浸没式光刻设备的传送区域
-
Application No.: US13067464Application Date: 2011-06-02
-
Publication No.: US08830443B2Publication Date: 2014-09-09
- Inventor: W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
- Applicant: W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20
Abstract:
A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.
Public/Granted literature
- US20110235007A1 Environmental system including a transport region for an immersion lithography apparatus Public/Granted day:2011-09-29
Information query
