Invention Grant
US08829595B2 3-Dimensional non-volatile memory device, memory system including the same, and method of manufacturing the device
有权
3维非易失性存储器件,包括其的存储器系统以及该器件的制造方法
- Patent Title: 3-Dimensional non-volatile memory device, memory system including the same, and method of manufacturing the device
- Patent Title (中): 3维非易失性存储器件,包括其的存储器系统以及该器件的制造方法
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Application No.: US13600034Application Date: 2012-08-30
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Publication No.: US08829595B2Publication Date: 2014-09-09
- Inventor: Dong Kee Lee
- Applicant: Dong Kee Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2011-0140193 20111222
- Main IPC: H01L29/792
- IPC: H01L29/792 ; H01L21/28

Abstract:
A 3-dimensional non-volatile memory device, a memory system including the same, and a method of manufacturing the same comprise vertical channel layers protruding from a substrate, a plurality of interlayer insulating layers and a plurality of conductive layers alternately formed along the vertical channel layers, a charge trap layer surrounding the vertical channel layers, the charge trap layer having a smaller thickness in a plurality of first regions, interposed between the plurality of conductive layers and the vertical channel layers, than in a plurality of second regions, interposed between the plurality of interlayer insulating layers and the vertical channel layers and a blocking insulating layer formed in each of the plurality of first regions, between the plurality of conductive layers and the charge trap layer.
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