Invention Grant
- Patent Title: Power semiconductor device and method for manufacturing such a power semiconductor device
- Patent Title (中): 功率半导体器件及其制造方法
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Application No.: US13974178Application Date: 2013-08-23
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Publication No.: US08829563B2Publication Date: 2014-09-09
- Inventor: Munaf Rahimo , Marco Bellini , Maxi Andenna , Friedhelm Bauer , Iulian Nistor
- Applicant: ABB Technology AG
- Applicant Address: CH Zurich
- Assignee: ABB Technology AG
- Current Assignee: ABB Technology AG
- Current Assignee Address: CH Zurich
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: EP11155572 20110223
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/08

Abstract:
An insulated gate bipolar device is disclosed which can include layers of different conductivity types between an emitter electrode on an emitter side and a collector electrode on a collector side in the following order: a source region of a first conductivity type, a base layer of a second conductivity type, which contacts the emitter electrode in a contact area, an enhancement layer of the first conductivity type, a floating compensation layer of the second conductivity type having a compensation layer thickness tp, a drift layer of the first conductivity type having lower doping concentration than the enhancement layer and a collector layer of the second conductivity type.
Public/Granted literature
- US20130334566A1 POWER SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SUCH A POWER SEMICONDUCTOR DEVICE Public/Granted day:2013-12-19
Information query
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