Invention Grant
US08829247B2 Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern
有权
环状化合物，其制造方法，辐射敏感性组合物以及形成抗蚀剂图案的方法
- Patent Title: Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern
- Patent Title (中): 环状化合物，其制造方法，辐射敏感性组合物以及形成抗蚀剂图案的方法
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Application No.: US13500715Application Date: 2010-09-27
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Publication No.: US08829247B2Publication Date: 2014-09-09
- Inventor: Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
- Applicant: Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery LLP
- Priority: JP2009-232529 20091006
- International Application: PCT/JP2010/005796 WO 20100927
- International Announcement: WO2011/043029 WO 20110414
- Main IPC: C07C43/23
- IPC: C07C43/23 ; C07C41/30 ; C07C39/17
Abstract:
This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.
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