Invention Grant
- Patent Title: Dual mandrel sidewall image transfer processes
- Patent Title (中): 双心轴侧壁图像传输过程
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Application No.: US13737099Application Date: 2013-01-09
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Publication No.: US08828876B2Publication Date: 2014-09-09
- Inventor: David V. Horak , Charles W. Koburger, III , Shom Ponoth , Chih-Chao Yang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent H. Daniel Schnurmann
- Main IPC: H01L21/311
- IPC: H01L21/311 ; C23F1/04
Abstract:
A combination of two lithographically patterned mandrels can be employed in conjunction with sidewall spacers to provide two spacers. The two spacers may intersect each other and/or contact sidewall surfaces of each other to provide a thickness that is a sum of the thicknesses of the two spacers. Further, the two spacers may be patterned to provide various patterns. In addition, portions of at least one of the two spacers may be etched employing an etch mask. Additionally or alternately, an additional material may be selectively added to portions of one of the two spacers.
Public/Granted literature
- US20140190935A1 DUAL MANDREL SIDEWALL IMAGE TRANSFER PROCESSES Public/Granted day:2014-07-10
Information query
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