Invention Grant
- Patent Title: Photoelectric conversion apparatus, imaging apparatus using the same, and manufacturing method thereof
- Patent Title (中): 光电转换装置,使用其的成像装置及其制造方法
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Application No.: US13707537Application Date: 2012-12-06
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Publication No.: US08828808B2Publication Date: 2014-09-09
- Inventor: Kenichi Miyamoto , Masami Hayashi , Hideki Noguchi , Katsuaki Murakami
- Applicant: Kenichi Miyamoto , Masami Hayashi , Hideki Noguchi , Katsuaki Murakami
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2011-283787 20111226
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/0352 ; H01L31/115 ; H01L27/146 ; H01L29/66

Abstract:
A photoelectric conversion apparatus includes: an active matrix-type TFT array substrate on which photoelectric conversion elements and thin film transistors are arranged in a matrix shape, wherein the photoelectric conversion element connects with a drain electrode via a contact hole opened through a first interlayer insulation film provided above the thin film transistor, wherein a data line and a bias line are connected with the source electrode and the photoelectric conversion element via respective contact holes opened through the second interlayer insulation, and wherein at least a part of the photoelectric conversion element is fixed to have a shape different from a normal pixel between pixels adjacent to each other in an extending direction of the gate line, and an electrical connection between the photoelectric conversion element and the data line is cut off in the transistor of the pixel having the different shape.
Public/Granted literature
- US20130161627A1 PHOTOELECTRIC CONVERSION APPARATUS, IMAGING APPARATUS USING THE SAME, AND MANUFACTURING METHOD THEREOF Public/Granted day:2013-06-27
Information query
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