Compound, photosensitive composition comprising the same and photosensitive material

Invention Grant

US08828644B2 Compound, photosensitive composition comprising the same and photosensitive material 有权

Title translation: 化合物，包含它们的光敏组合物和感光材料

Patent Title: Compound, photosensitive composition comprising the same and photosensitive material
Patent Title (中): 化合物，包含它们的光敏组合物和感光材料
Application No.: US14009031

Application Date: 2013-01-24
Publication No.: US08828644B2

Publication Date: 2014-09-09
Inventor: Keon Woo Lee , Sang Kyu Kwak , Changsoon Lee , Hyehyeon Kim , Saehee Kim
Applicant: LG Chem, Ltd.
Applicant Address: KR Seoul
Assignee: LG Chem, Ltd.
Current Assignee: LG Chem, Ltd.
Current Assignee Address: KR Seoul
Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
Priority: KR10-2012-0010345 20120201
International Application: PCT/KR2013/000567 WO 20130124
International Announcement: WO2013/115521 WO 20130808
Main IPC: C07D403/02
IPC: C07D403/02 ; G03F7/004 ; G03F7/027 ; C07D487/04 ; C07C275/00

Abstract:

The present application relates to a novel compound, a photosensitive composition comprising the same and a photosensitive material.

Abstract(Chinese):

本申请涉及一种新型化合物，包含该化合物的光敏组合物和感光材料。

Public/Granted literature

Information query

Espacenet

IPC分类:

C	化学；冶金
C07	有机化学
C07D	杂环化合物（高分子化合物入C08）
C07D403/00	杂环化合物，含有两个或更多的杂环，以氮原子作为仅有的杂环原子，C07D401/00组不包含的
C07D403/02	.含两个杂环