A process for depositing nanostructured material onto a particulate substrate material comprising the steps of: a) preparing a precursor material; b) forming an atomized dispersion containing nanophased material when subjecting said precursor material to elevated temperature; and c) contacting the atomized dispersion with the substrate material to deposit the nanophased material on the substrate material. The substrate material is in mobile and particulate form for contacting step (c). An apparatus for carrying out the process is also disclosed.