Invention Grant
- Patent Title: Barrier film and method of manufacturing the same
- Patent Title (中): 阻隔膜及其制造方法
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Application No.: US13271434Application Date: 2011-10-12
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Publication No.: US08828528B2Publication Date: 2014-09-09
- Inventor: Andrew Chakchung Yu , Hiroaki Ono , Takahiro Kawana
- Applicant: Andrew Chakchung Yu , Hiroaki Ono , Takahiro Kawana
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JP2010-245132 20101101
- Main IPC: B32B7/02
- IPC: B32B7/02 ; B32B19/00 ; C23C16/40 ; C23C16/455
Abstract:
A barrier film includes a base which is formed of a plastic film having a first surface and a second surface opposed to the first surface, a first barrier layer which is formed on the first surface by an atomic layer deposition method and is made of an inorganic material having a water vapor barrier property; and a second barrier layer which is formed on the second surface by an atomic layer deposition method and is made of an inorganic material having a water vapor barrier property.
Public/Granted literature
- US20120107586A1 BARRIER FILM AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2012-05-03
Information query
