Invention Grant
- Patent Title: Large area dissolvable template lithography
- Patent Title (中): 大面积可溶模板光刻
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Application No.: US13773308Application Date: 2013-02-21
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Publication No.: US08828298B2Publication Date: 2014-09-09
- Inventor: Brian N. Hubert
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: B29C59/02
- IPC: B29C59/02

Abstract:
A method and system for patterning a substrate are provided. A template is formed by applying a precursor material to a patterned master substrate and curing or solidifying the precursor material. The template is detached from the master substrate using a carrier having a curved surface. The template is coated with a patterning material, and is then detached from the carrier and applied to the substrate to be patterned. The template is then dissolved without affecting the patterning material, and the patterning material may thereafter be finished to develop the pattern. In an alternate embodiment, the patterning material may be applied to the substrate and then imprinted using the template.
Public/Granted literature
- US20130153124A1 LARGE AREA DISSOLVABLE TEMPLATE LITHOGRAPHY Public/Granted day:2013-06-20
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