Invention Grant
US08828143B2 Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid 有权
用于在液体或超临界流体中快速热控制工件的装置和方法

Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid
Abstract:
A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.
Information query
Patent Agency Ranking
0/0