Invention Grant
US08826853B2 Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device
有权
用于将PECVD沉积在容器上的内部阻挡层的装置，该装置包括光学等离子体分析装置
- Patent Title: Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device
- Patent Title (中): 用于将PECVD沉积在容器上的内部阻挡层的装置，该装置包括光学等离子体分析装置
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Application No.: US11995185Application Date: 2006-07-12
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Publication No.: US08826853B2Publication Date: 2014-09-09
- Inventor: Jean-Michel Rius , Guy Feuilloley
- Applicant: Jean-Michel Rius , Guy Feuilloley
- Applicant Address: FR Octeville sur Mer
- Assignee: Sidel Participations
- Current Assignee: Sidel Participations
- Current Assignee Address: FR Octeville sur Mer
- Agency: Sughrue Mion, PLLC
- Priority: FR0507555 20050713
- International Application: PCT/FR2006/001703 WO 20060712
- International Announcement: WO2007/006977 WO 20070118
- Main IPC: C23C16/00
- IPC: C23C16/00 ; B05D7/22 ; H05H1/00 ; H05H1/24 ; C23C16/52 ; C23C16/04
Abstract:
An apparatus (1) for PECVD deposition of a thin layer of a barrier-effect material in a receptacle (3), the apparatus comprising: a structure (5) receiving the receptacle (3), said structure (5) defining a plasma-presence zone (18), said structure (5) being provided with an orifice (14) defining an axis (A1) and presenting an inside opening (15) opening out into the plasma-presence zone (18), and an outside opening (16) opening out outside said zone (18); an electromagnetic wave generator; and an optical plasma monitor device (19) including a pick-up (21) placed outside the plasma-presence zone (18) on the axis (A1) of said orifice.
Public/Granted literature
Information query
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