Invention Grant
- Patent Title: Semiconductor integrated circuit with thick gate oxide word line driving circuit
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Application No.: US14184870Application Date: 2014-02-20
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Publication No.: US08797810B2Publication Date: 2014-08-05
- Inventor: Hiroyuki Takahashi , Hidetaka Natsume
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Young & Thompson
- Priority: JP2007-292878 20071112
- Main IPC: G11C7/00
- IPC: G11C7/00

Abstract:
A semiconductor integrated circuit according to one aspect of the present invention may includes a plurality of driving circuits to drive a respective plurality of word lines with either a first voltage supplied from a first power supply or a second voltage supplied from a second power supply in accordance with a control signal, and a plurality of gate transistors in each of which a gate is connected to one of the plurality of word lines, and a connection state between a storage node and a bit line is changed based on the voltage provided to the word line connected to the gate. In the semiconductor integrated circuit, a gate oxide film of each of the plurality of gate transistors is thinner than a gate oxide film of each of transistors constituting the plurality of driving circuits.
Public/Granted literature
- US20140169073A1 SEMICONDUCTOR INTEGRATED CIRCUIT WITH THICK GATE OXIDE WORD LINE DRIVING CIRCUIT Public/Granted day:2014-06-19
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