Invention Grant
US08797797B2 Non-volatile memory device, method for fabricating the same, and method for operating the same 有权
非易失性存储器件及其制造方法及其操作方法

  • Patent Title: Non-volatile memory device, method for fabricating the same, and method for operating the same
  • Patent Title (中): 非易失性存储器件及其制造方法及其操作方法
  • Application No.: US13606818
    Application Date: 2012-09-07
  • Publication No.: US08797797B2
    Publication Date: 2014-08-05
  • Inventor: Yoo-Hyun Noh
  • Applicant: Yoo-Hyun Noh
  • Applicant Address: KR Gyeonggi-do
  • Assignee: SK Hynix Inc.
  • Current Assignee: SK Hynix Inc.
  • Current Assignee Address: KR Gyeonggi-do
  • Agency: IP & T Group LLP
  • Priority: KR10-2011-0139636 20111221
  • Main IPC: G11C16/10
  • IPC: G11C16/10 G11C16/04 G11C16/34
Non-volatile memory device, method for fabricating the same, and method for operating the same
Abstract:
A non-volatile memory device includes a first string and a second string that each include a first drain selection transistor, a second drain selection transistor, a plurality of memory cells, and a source selection transistor that are coupled in series in that order, respectively, a first bit line coupled with a node between the first and second drain selection transistors of the first string, and a second bit line coupled with an end node of the second string on the side of the first drain selection transistor of the second string, wherein gates of the first drain selection transistors of the first and second strings are coupled with each other, and gates of the second drain selection transistors of the first and second strings are coupled with each other.
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