Invention Grant
- Patent Title: Wavefront aberration measuring device and method and wavefront aberration adjusting method
- Patent Title (中): 波前像差测量装置及方法及波前像差调整方法
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Application No.: US12713598Application Date: 2010-02-26
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Publication No.: US08797520B2Publication Date: 2014-08-05
- Inventor: Taketoshi Negishi
- Applicant: Taketoshi Negishi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2007-219215 20070827
- Main IPC: G01B9/00
- IPC: G01B9/00

Abstract:
A wavefront aberration measuring apparatus which measures an wavefront aberration of an optical system to be inspected includes a point light source which supplies a measuring light; a photodetector which has a detection surface arranged at a position optically conjugate with the point light source; a wavefront change applying section which is arranged in an optical path between the point light source and the photodetector and which applies a wavefront change to the light outcome from the optical system; and a measuring section which measures the wavefront aberration of the optical system based on an output of the photodetector and the wavefront change applied by the wavefront change applying section. It is possible to measure the wavefront aberration of the optical system with a relatively simple construction, without using the interference method.
Public/Granted literature
- US20100149549A1 WAVEFRONT ABERRATION MEASURING DEVICE AND METHOD AND WAVEFRONT ABERRATION ADJUSTING METHOD Public/Granted day:2010-06-17
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