Invention Grant
- Patent Title: Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
- Patent Title (中): 检测方法和装置,光刻设备,光刻处理单元和器件制造方法
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Application No.: US12993460Application Date: 2009-05-26
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Publication No.: US08797509B2Publication Date: 2014-08-05
- Inventor: Olav Johannes Seijger , Martinus Joseph Kok , Sander Kerssemakers , Mark Johannes Magielsen
- Applicant: Olav Johannes Seijger , Martinus Joseph Kok , Sander Kerssemakers , Mark Johannes Magielsen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2009/056365 WO 20090526
- International Announcement: WO2009/144218 WO 20091203
- Main IPC: G03B27/58
- IPC: G03B27/58

Abstract:
A substrate table positioning device that is supported by four bearing elements is provided. The substrate table positioning device also includes a balance mass. Two of the bearing elements support the base frame in such a way that they can move in a vertical direction independently of the other bearing elements. This can be achieved by using a hinge. This structure of substrate table positioning device has a higher lowest Eigen frequency of oscillation than that of substrate table positioning devices supported by three bearing elements. As such, the balance mass is not excited by typical vibrations that occur in the lithographic apparatus. This enables better positional control of the substrate table. It also enables at least some of the dimensions of the frame elements of the balance mass to be reduced.
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