A liquid immersion exposure apparatus and method exposes a substrate. The apparatus includes a projection optical system having an optical element via which exposure light is projected through liquid and a member having a channel in which the liquid flows. The member has an opening through which the exposure light passes. A gap is formed between a first surface of the member and a second surface of at least one of the optical element and a holding component which holds the optical element, and at least a portion of one or both of the first surface and the second surface is liquid repellent.