Invention Grant
US08797502B2 Exposure apparatus, exposure method, and method for producing device with electricity removal device by adding additive to liquid
有权
曝光装置，曝光方法以及通过向液体添加添加剂来制造具有除电装置的装置的方法
- Patent Title: Exposure apparatus, exposure method, and method for producing device with electricity removal device by adding additive to liquid
- Patent Title (中): 曝光装置，曝光方法以及通过向液体添加添加剂来制造具有除电装置的装置的方法
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Application No.: US12929503Application Date: 2011-01-28
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Publication No.: US08797502B2Publication Date: 2014-08-05
- Inventor: Yoshitomo Nagahashi
- Applicant: Yoshitomo Nagahashi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2003-336888 20030929
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.
Public/Granted literature
- US20110122377A1 Projection exposure apparatus, projection exposure method, and method for producing device Public/Granted day:2011-05-26
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