Invention Grant
- Patent Title: Pixel structure, method of manufacturing pixel structure, and active device matrix substrate
- Patent Title (中): 像素结构,像素结构制造方法和有源器件矩阵衬底
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Application No.: US13592347Application Date: 2012-08-23
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Publication No.: US08796688B2Publication Date: 2014-08-05
- Inventor: Feng-Weei Kuo , Ko-Ruey Jen , Chia-Hua Yu , I-Fang Wang
- Applicant: Feng-Weei Kuo , Ko-Ruey Jen , Chia-Hua Yu , I-Fang Wang
- Applicant Address: TW New Taipei
- Assignee: Hannstar Display Corporation
- Current Assignee: Hannstar Display Corporation
- Current Assignee Address: TW New Taipei
- Agency: Jianq Chyun IP Office
- Priority: CN201210190372 20120608
- Main IPC: H01L29/04
- IPC: H01L29/04

Abstract:
A pixel structure, a method of manufacturing the pixel structure, and an active device matrix substrate are provided. The pixel structure includes a first patterned metal layer having a common line and a gate; a first insulation layer; a semiconductor pattern; a second patterned metal layer having a source and a drain both electrically connected to the semiconductor pattern; a second insulation layer having a contact opening exposing the drain; and an electrode layer having a common electrode, and a pixel electrode connected to the drain through the contact opening. The common line, the first insulation layer, and the pixel electrode constitute a first storage capacitor. The common line, the drain, and the common electrode constitute a sandwich structure. The common line, the first insulation layer, and the drain constitute a second storage capacitor. The drain, the second insulation layer, and the common electrode constitute a third storage capacitor.
Public/Granted literature
- US20130328052A1 PIXEL STRUCTURE, METHOD OF MANUFACTURING PIXEL STRUCTURE, AND ACTIVE DEVICE MATRIX SUBSTRATE Public/Granted day:2013-12-12
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