Invention Grant
- Patent Title: Semiconductor tunnel FET transistor device
- Patent Title (中): 半导体隧道FET晶体管器件
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Application No.: US13760755Application Date: 2013-02-06
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Publication No.: US08796669B2Publication Date: 2014-08-05
- Inventor: Takahisa Kanemura
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Knobbe, Martens, Olson & Bear LLP
- Priority: JP2012-196664 20120906
- Main IPC: H01L27/08
- IPC: H01L27/08 ; H01L29/78

Abstract:
In one embodiment, a semiconductor device includes a substrate, and a source region of a first conductivity type disposed on a surface of the substrate. The device further includes a tunnel insulator disposed on the source region, and an impurity semiconductor layer of a second conductivity type disposed on the tunnel insulator, the second conductivity type being different from the first conductivity type. The device further includes a gate insulator disposed on the impurity semiconductor layer, and a gate electrode disposed on the gate insulator. The device further includes a drain region of the second conductivity type disposed on the substrate so as to be separated from the impurity semiconductor layer, or disposed on the substrate as a portion of the impurity semiconductor layer.
Public/Granted literature
- US20140061777A1 SEMICONDUCTOR DEVICE Public/Granted day:2014-03-06
Information query
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