Invention Grant
- Patent Title: Photosensitive resin composition for microlenses
- Patent Title (中): 用于微透镜的光敏树脂组合物
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Application No.: US13989185Application Date: 2011-11-21
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Publication No.: US08796349B2Publication Date: 2014-08-05
- Inventor: Hiroyuki Soda , Takahiro Sakaguchi , Takahiro Kishioka
- Applicant: Hiroyuki Soda , Takahiro Sakaguchi , Takahiro Kishioka
- Applicant Address: JP Tokyo
- Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2010-266469 20101130
- International Application: PCT/JP2011/076812 WO 20111121
- International Announcement: WO2012/073742 WO 20120607
- Main IPC: C08G61/12
- IPC: C08G61/12 ; C08F2/46 ; C08G61/04 ; G03F7/023 ; G02B1/04 ; G03F7/40

Abstract:
There is provided a photosensitive resin composition for microlenses. A photosensitive resin composition for microlenses including a component (A), a component (B) and a solvent. The component (A): a copolymer having a maleimide structural unit of Formula (1) and a repeating structural unit of Formula (2). The component (B): a photosensitizer (in Formula (2), R0 is a hydrogen atom or a methyl group; R1 is a single bond or a C1-5 alkylene group; R2 is a thermally cross-linkable monovalent organic group; and in the repeating structural unit of Formula (2), R0s are optionally different from each other).
Public/Granted literature
- US20130245152A1 PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENSES Public/Granted day:2013-09-19
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