Invention Grant
- Patent Title: Optical cavity furnace for semiconductor wafer processing
- Patent Title (中): 光腔炉用于半导体晶圆加工
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Application No.: US12919433Application Date: 2009-03-12
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Publication No.: US08796160B2Publication Date: 2014-08-05
- Inventor: Bhushan L. Sopori
- Applicant: Bhushan L. Sopori
- Applicant Address: US CO Golden
- Assignee: Alliance for Sustainable Energy, LLC
- Current Assignee: Alliance for Sustainable Energy, LLC
- Current Assignee Address: US CO Golden
- Agent John C. Stolpa
- International Application: PCT/US2009/036896 WO 20090312
- International Announcement: WO2009/148678 WO 20091210
- Main IPC: H01L21/26
- IPC: H01L21/26 ; F27D11/12

Abstract:
An optical cavity furnace 10 having multiple optical energy sources 12 associated with an optical cavity 18 of the furnace. The multiple optical energy sources 12 may be lamps or other devices suitable for producing an appropriate level of optical energy. The optical cavity furnace 10 may also include one or more reflectors 14 and one or more walls 16 associated with the optical energy sources 12 such that the reflectors 14 and walls 16 define the optical cavity 18. The walls 16 may have any desired configuration or shape to enhance operation of the furnace as an optical cavity 18. The optical energy sources 12 may be positioned at any location with respect to the reflectors 14 and walls defining the optical cavity. The optical cavity furnace 10 may further include a semiconductor wafer transport system 22 for transporting one or more semiconductor wafers 20 through the optical cavity.
Public/Granted literature
- US20110003485A1 Optical Cavity Furnace for Semiconductor Wafer Processing Public/Granted day:2011-01-06
Information query
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