Invention Grant
US08796159B2 Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions
有权
使用线型光束的衬底上的膜区域的激光结晶处理的工艺和系统，以及这些膜区域的结构
- Patent Title: Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions
- Patent Title (中): 使用线型光束的衬底上的膜区域的激光结晶处理的工艺和系统，以及这些膜区域的结构
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Application No.: US11373772Application Date: 2006-03-09
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Publication No.: US08796159B2Publication Date: 2014-08-05
- Inventor: James S. Im , Paul Christiaan van der Wilt
- Applicant: James S. Im , Paul Christiaan van der Wilt
- Applicant Address: US NY New York
- Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee Address: US NY New York
- Agency: Baker Botts L.L.P.
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
Process and system for processing a thin film sample, as well as at least one portion of the thin film structure are provided. Irradiation beam pulses can be shaped to define at least one line-type beam pulse, which includes a leading portion, a top portion and a trailing portion, in which at least one part has an intensity sufficient to at least partially melt a film sample. Irradiating a first portion of the film sample to at least partially melt the first portion, and allowing the first portion to resolidify and crystallize to form an approximately uniform area therein. After the irradiation of the first portion of the film sample, irradiating a second portion using a second one of the line-type beam pulses to at least partially melt the second portion, and allowing the second portion to resolidify and crystallize to form an approximately uniform area therein. A section of the first portion impacted by the top portion of the first one of the line-type beam pulses is prevented from being irradiated by trailing portion of the second one of the line-type beam pulses.
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Information query
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