Invention Grant
- Patent Title: Printed, self-aligned, top gate thin film transistor
- Patent Title (中): 印刷,自对准,顶栅薄膜晶体管
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Application No.: US11818078Application Date: 2007-06-12
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Publication No.: US08796125B2Publication Date: 2014-08-05
- Inventor: Joerg Rockenberger , James Montague Cleeves , Arvind Kamath
- Applicant: Joerg Rockenberger , James Montague Cleeves , Arvind Kamath
- Applicant Address: US CA Sunnyvale
- Assignee: Kovio, Inc.
- Current Assignee: Kovio, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agency: Murabito Hao & Barnes LLP
- Agent Andrew D. Fortney
- Main IPC: H01L21/22
- IPC: H01L21/22 ; H01L29/45 ; H01L29/49 ; H01L29/66 ; B82Y10/00 ; H01L29/786

Abstract:
A self-aligned top-gate thin film transistor (TFT) and a method of forming such a thin film transistor, by forming a semiconductor thin film layer; printing a doped glass pattern thereon, a gap in the doped glass pattern defining a channel region of the TFT; forming a gate electrode on or over the channel region, the gate electrode comprising a gate dielectric film and a gate conductor thereon; and diffusing a dopant from the doped glass pattern into the semiconductor thin film layer.
Public/Granted literature
- US20070287237A1 Printed, self-aligned, top gate thin film transistor Public/Granted day:2007-12-13
Information query
IPC分类: