Invention Grant
- Patent Title: Method for forming an organic material layer on a substrate
- Patent Title (中): 在基材上形成有机材料层的方法
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Application No.: US13303037Application Date: 2011-11-22
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Publication No.: US08796067B2Publication Date: 2014-08-05
- Inventor: Cedric Rolin , Jan Genoe
- Applicant: Cedric Rolin , Jan Genoe
- Applicant Address: BE NL BE
- Assignee: IMEC,Nederlandse Organisatie voor Toegepast-Natuurwe tenschappelijk Onderzoek (TNO),UniversitéCatholique de Louvain (UCL)
- Current Assignee: IMEC,Nederlandse Organisatie voor Toegepast-Natuurwe tenschappelijk Onderzoek (TNO),UniversitéCatholique de Louvain (UCL)
- Current Assignee Address: BE NL BE
- Agency: Knobbe, Martens, Olson & Bear LLP
- Main IPC: H01L51/40
- IPC: H01L51/40

Abstract:
A method for forming an organic material layer on a substrate in an in-line deposition system is disclosed. In one aspect, the organic material is deposited with a predetermined non-constant deposition rate profile, which includes a first predetermined deposition rate range provided to deposit at least a first monolayer of the organic material layer with a first predetermined average deposition rate and a second predetermined deposition rate range provided to deposit at least a second monolayer of the organic material layer with a second predetermined average deposition rate. The injection of organic material through the openings of the injector is controlled for realizing the predetermined deposition rate profile.
Public/Granted literature
- US20120129296A1 METHOD FOR FORMING AN ORGANIC MATERIAL LAYER ON A SUBSTRATE Public/Granted day:2012-05-24
Information query
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