Invention Grant
- Patent Title: System and method for processing target material
- Patent Title (中): 用于处理目标材料的系统和方法
-
Application No.: US12415262Application Date: 2009-03-31
-
Publication No.: US08796029B2Publication Date: 2014-08-05
- Inventor: Won Seok Chung , Kak Namkoong , Joonho Kim , Kyuyoun Hwang , Heekyun Lim
- Applicant: Won Seok Chung , Kak Namkoong , Joonho Kim , Kyuyoun Hwang , Heekyun Lim
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2008-0119079 20081127
- Main IPC: G01N35/00
- IPC: G01N35/00 ; G01N33/53 ; G01N33/48 ; G01N21/07

Abstract:
A system for processing a target material includes; a cartridge which stores a material which reacts with the target material, and may include at least one chamber and at least one valve connected to the at least one chamber, a first module which may be loaded with the at least one cartridge and may rotate, a second module which may selectively open or close the at least one valve, a third module which may selectively control the temperature of the at least one chamber, and a control module which may control the first module, the second module and the third module.
Public/Granted literature
- US20100130732A1 SYSTEM AND METHOD FOR PROCESSING TARGET MATERIAL Public/Granted day:2010-05-27
Information query