Invention Grant
US08796029B2 System and method for processing target material 有权
用于处理目标材料的系统和方法

System and method for processing target material
Abstract:
A system for processing a target material includes; a cartridge which stores a material which reacts with the target material, and may include at least one chamber and at least one valve connected to the at least one chamber, a first module which may be loaded with the at least one cartridge and may rotate, a second module which may selectively open or close the at least one valve, a third module which may selectively control the temperature of the at least one chamber, and a control module which may control the first module, the second module and the third module.
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