Invention Grant
US08795929B2 Pellicle having buffer zone and photomask structure having pellicle
有权
具有缓冲区和具有防护薄膜的光掩模结构的防护薄膜
- Patent Title: Pellicle having buffer zone and photomask structure having pellicle
- Patent Title (中): 具有缓冲区和具有防护薄膜的光掩模结构的防护薄膜
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Application No.: US13549895Application Date: 2012-07-16
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Publication No.: US08795929B2Publication Date: 2014-08-05
- Inventor: Sung-Hyuck Kim , In-Kyun Shin , Bum-Hyun An
- Applicant: Sung-Hyuck Kim , In-Kyun Shin , Bum-Hyun An
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2011-0102665 20111007
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A pellicle including a frame having a square shape; and a buffer zone in the frame, the buffer zone dividing a lower surface of the frame into a plurality of portions.
Public/Granted literature
- US20130089814A1 PELLICLE HAVING BUFFER ZONE AND PHOTOMASK STRUCTURE HAVING PELLICLE Public/Granted day:2013-04-11
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