Invention Grant
US08795435B2 Susceptor, coating apparatus and coating method using the susceptor
有权
受体，涂层装置和使用感受器的涂布方法
- Patent Title: Susceptor, coating apparatus and coating method using the susceptor
- Patent Title (中): 受体，涂层装置和使用感受器的涂布方法
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Application No.: US12828963Application Date: 2010-07-01
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Publication No.: US08795435B2Publication Date: 2014-08-05
- Inventor: Shinya Higashi , Hironobu Hirata
- Applicant: Shinya Higashi , Hironobu Hirata
- Applicant Address: JP Tokyo JP Numazu-shi, Shizuoka
- Assignee: Kabushiki Kaisha Toshiba,NuFlare Technology, Inc.
- Current Assignee: Kabushiki Kaisha Toshiba,NuFlare Technology, Inc.
- Current Assignee Address: JP Tokyo JP Numazu-shi, Shizuoka
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2009-156809 20090701
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/458 ; C23C16/46
Abstract:
In accordance with the embodiment of the present invention, there is provided a susceptor which includes an annular first susceptor portion for supporting the peripheral portion of a silicon wafer and further includes a second susceptor portion provided in contact with the peripheral portion of the first susceptor portion and covering the opening of the first susceptor portion. The second susceptor portion is disposed so that, when the silicon wafer is supported on the first susceptor portion, a gap of a predetermined size is formed between the silicon wafer and the second susceptor portion, and so that another gap of a size substantially equal to the predetermined size and directly connected to the above gap is formed between the first susceptor portion and the second susceptor portion.
Public/Granted literature
- US20110171380A1 SUSCEPTOR, COATING APPARATUS AND COATING METHOD USING THE SUSCEPTOR Public/Granted day:2011-07-14
Information query
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