Invention Grant
- Patent Title: Radiation-hardened memory element with multiple delay elements
- Patent Title (中): 具有多个延迟元件的辐射硬化存储元件
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Application No.: US11389767Application Date: 2006-03-27
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Publication No.: US08767444B2Publication Date: 2014-07-01
- Inventor: David Nelson , Keith Golke , Harry H L Liu , Michael Liu
- Applicant: David Nelson , Keith Golke , Harry H L Liu , Michael Liu
- Applicant Address: US NJ Morristown
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morristown
- Agency: Shumaker & Sieffert, P.A.
- Main IPC: G11C11/41
- IPC: G11C11/41 ; G11C11/412 ; G11C11/413 ; G11C11/417 ; G11C7/02 ; G11C7/24 ; G11C5/02 ; G11C5/06

Abstract:
A radiation hardened memory element includes at least two delay elements for maintaining radiation hardness. In an example, the memory element is an SRAM cell. Both delays are coupled together in series so that if either one of the delays fails, a delay will still be maintained within the SRAM cell. The critical areas of the delays may be positioned so that a common line of sight cannot be made between each delay and a circuit node.
Public/Granted literature
- US20070242537A1 Radiation-hardened memory element with multiple delay elements Public/Granted day:2007-10-18
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