Invention Grant
- Patent Title: Cylindrical embedded capacitors
- Patent Title (中): 圆柱形嵌入式电容器
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Application No.: US12873931Application Date: 2010-09-01
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Publication No.: US08693163B2Publication Date: 2014-04-08
- Inventor: An-Jhih Su , Chi-Chun Hsieh , Tzu-Yu Wang , Wei-Cheng Wu , Hsien-Pin Hu , Shang-Yun Hou , Wen-Chih Chiou , Shin-Puu Jeng
- Applicant: An-Jhih Su , Chi-Chun Hsieh , Tzu-Yu Wang , Wei-Cheng Wu , Hsien-Pin Hu , Shang-Yun Hou , Wen-Chih Chiou , Shin-Puu Jeng
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L29/92
- IPC: H01L29/92 ; H01L21/768

Abstract:
A device includes a substrate having a front surface and a back surface opposite the front surface. A capacitor is formed in the substrate and includes a first capacitor plate; a first insulation layer encircling the first capacitor plate; and a second capacitor plate encircling the first insulation layer. Each of the first capacitor plate, the first insulation layer, and the second capacitor plate extends from the front surface to the back surface of the substrate.
Public/Granted literature
- US20120049322A1 Cylindrical Embedded Capacitors Public/Granted day:2012-03-01
Information query
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