Invention Grant
US08693006B2 Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
有权
反射器，光学元件，干涉仪系统，平台装置，曝光装置和装置制造方法
- Patent Title: Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
- Patent Title (中): 反射器，光学元件，干涉仪系统，平台装置，曝光装置和装置制造方法
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Application No.: US11475034Application Date: 2006-06-27
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Publication No.: US08693006B2Publication Date: 2014-04-08
- Inventor: Yuichi Shibazaki
- Applicant: Yuichi Shibazaki
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2005-188228 20050628; JP2005-188269 20050628
- Main IPC: G01B9/02
- IPC: G01B9/02
Abstract:
A reflecting member has: a first reflecting surface, which extends in a second direction that includes a first direction component; a second reflecting surface, which extends in a third direction that includes the first direction component, that is substantially symmetric to the first reflecting surface; and a third reflecting surface, which extends in a fourth direction, that is substantially orthogonal to the first direction.
Public/Granted literature
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