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US08692380B2 Integrated circuit system with sub-geometry removal and method of manufacture thereof 有权
具有子几何去除的集成电路系统及其制造方法

Integrated circuit system with sub-geometry removal and method of manufacture thereof
Abstract:
A method of manufacture of an integrated circuit system includes: forming reticle data; detecting a sub-geometry, a singularity, or a combination thereof in the reticle data; applying a unit cell, a patch cell, or a combination thereof for removing the sub-geometry, the singularity, or the combination thereof from the reticle data; and fabricating an integrated circuit from the reticle data.
Abstract(Chinese):

一种集成电路系统的制造方法，包括：形成掩模版数据; 在掩模版数据中检测子几何，奇点或其组合; 应用单元，补片或其组合以从掩模版数据中去除子几何，奇点或其组合; 并从掩模版数据制造集成电路。

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