Invention Grant
US08691619B2 Laminated structure for CIS based solar cell, and integrated structure and manufacturing method for CIS based thin-film solar cell
有权
CIS基太阳能电池层压结构,CIS基薄膜太阳能电池的综合结构与制造方法
- Patent Title: Laminated structure for CIS based solar cell, and integrated structure and manufacturing method for CIS based thin-film solar cell
- Patent Title (中): CIS基太阳能电池层压结构,CIS基薄膜太阳能电池的综合结构与制造方法
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Application No.: US12743686Application Date: 2008-11-25
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Publication No.: US08691619B2Publication Date: 2014-04-08
- Inventor: Hideki Hakuma , Katsuya Tabuchi , Yosuke Fujiwara , Katsumi Kushiya
- Applicant: Hideki Hakuma , Katsuya Tabuchi , Yosuke Fujiwara , Katsumi Kushiya
- Applicant Address: JP Tokyo
- Assignee: Showa Shell Sekiyu, K.K.
- Current Assignee: Showa Shell Sekiyu, K.K.
- Current Assignee Address: JP Tokyo
- Agency: Cermak Nakajima LLP
- Agent Tomoko Nakajima
- Priority: JP2007-311540 20071130
- International Application: PCT/JP2008/071318 WO 20081125
- International Announcement: WO2009/069582 WO 20090604
- Main IPC: H01L31/18
- IPC: H01L31/18

Abstract:
This invention aims to provide a laminated structure and an integrated structure of a high production efficiency for a CIS based thin-film solar cell, which can produce a high-resistance buffer layer of the CIS based thin-film solar cell efficiently on a series of production lines and which needs no treatment of wastes or the like, and a manufacturing method for the structures. The CIS based thin-film solar cell includes a back electrode, a p-type CIS based light absorbing layer, a high-resistance buffer layer and an n-type transparent conductive film laminated in this order. The high-resistance buffer layer and the n-type transparent conductive film are formed of thin films of a zinc oxide group. The buffer layer contacts the p-type CIS based light absorbing layer directly, and has a resistivity of 500Ω·cm or higher.
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